The wide range of micro- and nanooptical applications require optical elements with typical structure sizes beginning at several nanometers and ending in the range of millimeters. In the case of diffractive optics, it is known from the grating equation that the feature size is proportional to Lambda/NA, which implies for applications in the UV-wavelength range to typical structure lateral dimensionsin a range between 1 µm down to 100 nm and below. The fabrication of products with minimum features sizes down to the sub-micron range requires high-resolution lithography techniques.
Jenoptik Microoptics Nano Lithography is a mask less process in which we are able to pattern features with critical dimensions down to 100 nm (±20 nm). Positional accuracy is ±40 nm. This is provided on substrates up to 7" x 7" square in fused silica, quartz glass and optical glasses. These substrates can be etched with aspect ratios as high as 1:15. Products include diffractive lenses, fine-pitched gratings, polarizing optics, as well as multi-function optics.