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AR-plas®: Plasma Etching Enables Antireflection of Different Surface Shapes

Nanostructures prevent the reflection of light and provide ideal antireflection for surfaces of highly curved polymer optics.

The AR-plas® plasma etching process takes its cue from nature by imitating the structure of moths' eyes. These eyes are covered in rows of tiny, densely packed bumps that ensure no light beams are abruptly reflected. This gives the insects compound eyes that have optimal antireflection properties. Experts of Jenoptik etch similar nanostructures into the surface of polymer optics using plasma ions. These nanostructures are smaller than 100 nm. That means your images will be high-contrast and interference-free.

The plasma etching process provides impressive regularity for any shape: Whether the optics are flat or convex, the reflection is suppressed right to the edge with color neutrality, even if the angle of incidence of the light is larger. The result is absolute regularity. This process is also quick and cost-effective.

Jenoptik is one of the few companies in the world to offer plasma etching. AR-plas® was developed by the Fraunhofer Institute for Applied Optics and Precision Engineering in Jena, Germany. It was then put into production at Jenoptik. In 2012, the scientists behind this special process received the "Thüringer Forschungspreis" — a research prize awarded in the German State of Thuringia.


Benefits

  • Color-neutral: Uniform suppression of reflections
  • Flexible: Suitable for smooth and highly curved surfaces
  • Quick and cost-effective: The moth-eye structure forms by itself
  • High-precision: Provides high-contrast, interference-free images

Fields of Application

  • Automotive industry: Antireflection of internal surfaces that are not subject to stress
  • Health care: Antireflection for endoscopy and cameras

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Polymer Optics & Optoelectronic Systems

+49 36482 45-206

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